材料科学
X射线光电子能谱
工作职能
纳米结构
场电子发射
光致发光
纳米线
开尔文探针力显微镜
氧气
分析化学(期刊)
电流密度
密度泛函理论
纳米技术
光谱学
光电子学
原子力显微镜
核磁共振
计算化学
电子
化学
物理
图层(电子)
有机化学
量子力学
色谱法
作者
Arnab Ghosh,Puspendu Guha,Ranjit Thapa,Sinthika Selvaraj,Mohit Kumar,Bipul Rakshit,Tapan Dash,Rajshekhar Bar,Samit Kumar Ray,Parlapalli Venkata Satyam
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2016-02-17
卷期号:27 (12): 125701-125701
被引量:48
标识
DOI:10.1088/0957-4484/27/12/125701
摘要
The lowering of the work function (Φ) can lead to a better field emission (FE) behavior at lower threshold fields. We report on enhanced FE from randomly oriented and faceted Au-capped ZnO hetero-nanostructures (HNs) having more oxygen defects. Large-area arrays of non-aligned, faceted Au-capped ZnO HNs, such as nanowires (NWs) and triangular nanoflakes (TNFs) are grown using the chemical vapor deposition (CVD) method. Enhanced FE properties from the TNF sample resulted in a turn-on field as low as 0.52 V μm(-1) at a current density of 0.1 mA cm(-2) and a field enhancement factor (β) as high as ≈5.16 × 10(5). Under similar experimental conditions, drawing the same current density from an NW specimen needs a higher turn-on field (0.86 V μm(-1)) and to exhibit nearly four times less field enhancement factor compared to the TNFs samples. X-ray photoelectron spectroscopy (XPS) and photoluminescence (PL) measurements confirm the presence of more oxygen defects in the TNF samples compared to the NW samples. Kelvin probe force microscopy (KPFM) measurements show the average local work function to be 4.70 ± 0.1 eV for the TNF sample, which is ≈ 0.34 eV lower than the NW sample. Using density functional theory (DFT) calculations, the estimated Φ values are found to be 4.98 eV for ZnO(0001), 4.17 eV for Au(001)/ZnO(0001) and 3.91 eV for Au(001)/Ovac-ZnO(0001) surfaces. The DFT results are qualitatively in agreement with our experimental results. The presence of Au nanostructures on top of O-deficient and sharp-tipped TNFs results in enhanced FE performance following their reduced tunneling barrier via pinning of effective Φ.
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