材料科学
残余应力
抗弯强度
复合材料
拉曼光谱
热的
弯曲
碳化硅
光学
物理
气象学
作者
Xiaobing Zhou,Youbing Li,Yifan Li,Zhen “Leo” Liu,Hui Xian Yang,Shurong Ding,Young‐Hwan Han,Jaehyung Lee,Shiyu Du,Qing Huang
摘要
Abstract Residual thermal stresses in SiC/Ti 3 SiC 2 /SiC joining couples were calculated by Raman spectra and simulated by finite element analysis, and then relaxed successfully by postannealing. The results showed that the thermal residual stress between Ti 3 SiC 2 and SiC was about on the order of 1 GP a when cooling from 1300°C to 25°C. The thermal residual stresses can be relaxed by the recovery of structure disorders during postannealing. When the SiC/Ti 3 SiC 2 /SiC joints postannealed at 900°C, the bending strength reached 156.9 ± 13.5 MP a, which was almost twice of the as‐obtained SiC/Ti 3 SiC 2 /SiC joints. Furthermore, the failure occurred at the SiC matrix suggested that both the flexural strength of joining layer and interface were higher than the SiC matrix.
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