材料科学
光电探测器
锗
光电子学
氮化物
蚀刻(微加工)
氮化硅
波长
极限抗拉强度
硅
复合材料
图层(电子)
作者
Yiding Lin,Danhao Ma,Rui‐Tao Wen,Kwang Hong Lee,Xin Guo,Jin Zhou,Hong Wang,Chuan Seng Tan,Jürgen Michel
出处
期刊:Conference on Lasers and Electro-Optics
日期:2019-01-01
卷期号:: STh4O.2-STh4O.2
被引量:1
标识
DOI:10.1364/cleo_si.2019.sth4o.2
摘要
Germanium photodetector, formed with a self-aligned dry etching method, together with a tensile silicon nitride sidewall stressor, exhibits a strain profile with improved uniformity and a ~2× enhancement on the quantum efficiency at the L-band.
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