俘获
光电子学
材料科学
微波食品加热
钝化
场效应晶体管
晶体管
宽禁带半导体
图层(电子)
工程物理
纳米技术
电气工程
计算机科学
电压
物理
工程类
电信
生物
生态学
作者
S.C. Binari,P. B. Klein,T.E. Kazior
出处
期刊:Proceedings of the IEEE
[Institute of Electrical and Electronics Engineers]
日期:2002-06-01
卷期号:90 (6): 1048-1058
被引量:456
标识
DOI:10.1109/jproc.2002.1021569
摘要
It is well known that trapping effects can limit the output power performance of microwave field-effect transistors (FETs). This is particularly true for the wide bandgap devices. In this paper we review the various trapping phenomena observed in SiC- and GaN-based FETs that contribute to compromised power performance. For both of these material systems, trapping effects associated with both the surface and with the layers underlying the active channel have been identified. The measurement techniques utilized to identify these traps and some of the steps taken to minimize their effects, such as modified buffer layer designs and surface passivation, are described. Since similar defect-related phenomena were addressed during the development of the GaAs technology, relevant GaAs work is briefly summarized.
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