X射线光电子能谱
俄歇电子能谱
分析化学(期刊)
无定形固体
无定形碳
氢
材料科学
化学
结晶学
核磁共振
物理
有机化学
色谱法
核物理学
作者
Juan C. Lascovich,S. Scaglione
标识
DOI:10.1016/0169-4332(94)90026-4
摘要
The ratio R of Sp3 to Sp2 in hydrogenated amorphous carbon (a-C:H) has been evaluated by X-ray Auger electron spectroscopy (XAES), photoelectron energy loss spectroscopy (PELS) and X-ray photoelectron spectroscopy (XPS). Hydrogenated amorphous carbon samples have been deposited by dual ion beam sputtering technique (DIBS). Percentages of Sp2 sites are in the range of 45% to 70% for all analyzed samples. Values measured by XAES are about 10% greater than values measured by PELS and the XPS evaluation appears in agreement with them. Besides, R values seem to be influenced not only by hydrogen contents but even by parameters of deposition (i.e. energy of hydrogen ion beam and growth rate).
科研通智能强力驱动
Strongly Powered by AbleSci AI