铟
热压连接
材料科学
晶片键合
薄脆饼
倒装芯片
光电子学
氧化物
超导电性
模具(集成电路)
氧化铟锡
复合材料
冶金
纳米技术
图层(电子)
胶粘剂
物理
量子力学
作者
Ku Kang,Jaber Derakhshandeh,Christian Wendeln,Ralf Schmidt,Hao-yu,Ehsan Shafahian,Zaid El-Mekki,Tom Cochet,Masataka Maehara,Eric Beyne
标识
DOI:10.23919/icep61562.2024.10535594
摘要
This paper introduces a method for direct electrodeposition of indium on superconducting (SC) layers with an optimized electrolyte. Indium-to-indium bump and indium-to-SC layers bonding is achieved using plated wafers. An atmospheric plasma cleaning process removes indium native oxide, and a thermocompression bonding (TCB) process is developed at air, enabling successful bonding of In-In and In-SC layers with different microbumps pitch. Plasma-treated indium bumps exhibit high applicability for successful flip chip bonding at low temperatures in an air atmosphere, as confirmed by cross-section SEM and die shear analysis.
科研通智能强力驱动
Strongly Powered by AbleSci AI