Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System

The illumination system of extreme ultraviolet lithography (EUVL) is the core of extreme ultraviolet lithography. The illumination system is responsible for providing a variety of complex off-axis illumination modes, and illuminating the mask with high uniformity. In this paper, a design of high numerical aperture (NA) anamorphic EUV illumination system with large field of view is completed. Simulation results show that the system can satisfied the requirements of high uniformity on the mask under different illumination modes.