光学
材料科学
红外线的
红外显微镜
折射
基质(水族馆)
显微镜
抛光
光电子学
数码产品
分辨率(逻辑)
计算机科学
物理
人工智能
工程类
地质学
复合材料
电气工程
海洋学
作者
Stephen LaLumondiere,T.S. Yeoh
出处
期刊:
[ASM International]
日期:2010-11-01
卷期号:12 (4): 4-10
标识
DOI:10.31399/asm.edfa.2010-4.p004
摘要
Abstract This article demonstrates a simple and robust backside illumination method for infrared imaging of ICs. The technique uses oblique illumination, which removes surface noise components while providing bright-field illumination under the surface, and requires only modest if any polishing of the backside of the substrate. As the examples in the article show, it can be implemented with a standard microscope with IR optics, yielding high contrast, high resolution images without the need for complex lenses, AR coatings, or sophisticated scanning electronics.
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