Research for polyimide as a sacrificial layer in MEMS device

Polyimide has been an important sacrificial layer material in the MEMS switch. Polyimide can be spun and photographied on silicon substrate. NaOH liquid can etch and develop polyimide. Then it needs to cure. After MEMS switch are manufactured, polyimide must be removed. The different cure temperature and time impacts the character of polyimide. The experiment result shows that it is easy to remove and can be lithographed. So it is suitable for microwave device. In this paper, refers that polyimide can be etched by NaOH, O2 and CF4.