임프린트 리쏘그라피를 이용한 나노선 편광 소자의 제작

We have demonstrated a nanowire polarizer fabricated by the nanoimprint lithography. The nanowire polarizer is a form of an aluminum grating with a period of 200 ㎚ on a glass substrate. The polymer resist pattern for metal etching process was formed by the nanoimprint lithography with a silicon-oxide stamp, which was made by the laser interference lithography and the reactive ion etching. The polarization extinction ratio of the fabricated device is measured to be -38 ㏈ at 1550 ㎚. The nanoimprint lithography is a promising and cheap way to fabricate subwavelength-period optical elements.