光致发光
氧烷
退火(玻璃)
薄膜
材料科学
分析化学(期刊)
吸收光谱法
吸收边
八面体
吸收(声学)
激光烧蚀
结晶学
化学
谱线
激光器
晶体结构
光学
光电子学
纳米技术
带隙
物理
色谱法
复合材料
天文
作者
Masashi Ishii,Shuji Komuro,Takitaro Morikawa,Yoshinobu Aoyagi,Tetsuya Ishikawa,Tatzuo Ueki
标识
DOI:10.7567/jjaps.38s1.191
摘要
Peak height and second-derivative analyses of Er L III -edge X-ray absorption near edge structure (XANES) are performed to investigate the optical activation process of Er in Si:Er 2 O 3 thin film produced by the laser ablation method. The as-ablated sample has a high resonant absorption peak, and the second-derivative analysis of the peak gives a singlet in contrast to the doublet for Er 2 O 3 powder. This is explained by the concentration of the density of states (DOS) due to a higher order symmetry such as an ErO 6 octahedron in the as-ablated sample. After annealing, a quasi-doublet is observed in the second-derivative spectrum, suggesting the distortion of the octahedral structure. The increment of photoluminescence intensity after annealing is considered to be caused by this symmetrical degradation.
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