偏振器
绝缘体上的硅
消光比
材料科学
插入损耗
光电子学
蚀刻(微加工)
制作
光学
硅
波长
物理
双折射
纳米技术
医学
病理
替代医学
图层(电子)
作者
Shaimaa I. Azzam,Mohamed Farhat O. Hameed,Nihal F. F. Areed,Maher Abdelrazzak,Hamdy A. Elmikaty,S. S. A. Obayya
标识
DOI:10.1109/lpt.2014.2329416
摘要
An all-dielectric transverse electric (TE)-/transverse magnetic (TM)-pass polarizer based on silicon-on-insulator (SoI) is proposed and analyzed. The symmetric etching of the silicon nanowire with specific values allows the cutoff of the undesired polarization state while the other is propagated with minimal losses. The proposed SoI polarizer can achieve 26- and 30-dB extinction ratios and 0.4-dB insertion losses for both TE- and TM-pass polarizers, respectively, with a very compact device length as short as 2.5 μm. The polarizer maintains <;1-dB insertion loss and >20-dB extinction ratio over a wide wavelength range of 1.454-1.68 μm. Fabrication of the introduced device is compatible with standard CMOS fabrication process.
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