Effect of deposition temperature on transparent conductive properties of γ-CuI film prepared by vacuum thermal evaporation

Copper (I) iodide (CuI) films are grown on glass substrates with a direct vacuum thermal evaporation method, and the effect of substrate temperature on their photoluminescence and transparent conductive properties is discussed. The X-ray diffraction (XRD) measurement identifies the polycrystalline CuI film has γ-phase with (111) preferential growth direction. When the substrate temperature is optimised at 120 °C, the average transmittance is about 90% in the wavelength range of 410–1500 nm. The electrical properties measured by Hall effect show the lowest resistivity of 1.0 × 10−2 Ωcm with hole concentration of 3.0 × 1019 cm−3 and mobility of 25 cm2 V−1s−1. These results indicate that direct thermal deposition is a simple method to grow high quality p-type CuI films.