期刊:2019 5th Conference on Knowledge Based Engineering and Innovation (KBEI)日期:2019-02-01卷期号:30: 384-388被引量:1
标识
DOI:10.1109/kbei.2019.8735064
摘要
High performance UV Schottky photodiodes fabricated by ZnO thin film on Si substrate using sol-gel method have been studied. The Photodiode prepared in this study has a structure of Metal/ZnO/n-Si. The current-voltage (I-V) characteristics of the as-fabricated Schottky photodiodes show an excellent room temperature contrast ratio of ~7325.38 and responsivity of ~71.68 A/W at a reverse bias voltage of -4V, when the device was illuminated by an UV source of ~600 μW output power at ~360 nm. Measurements of contrast ratio and responsivity were made at room temperature, the obtained values are believed to be superior compared to those reported in literature.