响应度
探测器
材料科学
电子
光电子学
灵敏度(控制系统)
二极管
光学
硅
扫描电子显微镜
光电探测器
物理
电子工程
核物理学
工程类
作者
Yi-Hsiang Chien,Yun-Ju Chuang,Chih‐Hao Lee,Fu‐Rong Chen
出处
期刊:Microscopy
[Oxford University Press]
日期:2015-11-01
卷期号:64 (suppl 1): i32.2-i32
标识
DOI:10.1093/jmicro/dfv115
摘要
A high sensitivity and high responsivity silicon pin design for the detection of backscattering electrons of a scanning electron microscopy is in progress. The design uses a multi-annular configuration which has four working areas. To improve the sensitivity, the new device is equipped with lateral p-n junctions. The depletion layers formed by p-n junction intersect the surface of detector and it can detect low energy electrons. There are guard rings surrounding each of the working area to prevent the signals from other working areas. Besides, Al metal grid was formed on the top of lateral p-n junctions as electrode to lower the series resistance of large area detector. It improved its responsivity This new BSED can have better surface topography contrast due to its high sensitivity to low energy electrons. It also has more excellent resolution because of its low S/N ratio. And the Al grid enhance the responsivity of the detector. The new BSE detector developed here has potential for use in advanced SEM system.
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