The current status of nano-imprint lithography and its future outlook toward carbon neutrality by 2050

Nano-imprint lithography (NIL) has unique features, including the ability to design at a resolution of 1x nm and three dimensional patterning. Although productivity was a concern for NIL, improvement has been made with recent technologies such as multi-field imprint and spin-coating resist. However, the environment surrounding the semiconductor industry is changing. One of the biggest waves is "carbon neutrality," and it is believed that energy-saving technologies will be important for the future of the semiconductor industry. In this study, we evaluate the current performance of NIL and its future prospects as an energy-saving technology that will help the world achieve carbon neutrality by 2050.