晶体管
特征(语言学)
材料科学
计算机科学
纳米光刻
纳米技术
制作
电气工程
工程类
电压
语言学
医学
哲学
病理
替代医学
作者
Xiaqing Fu,Zhifang Liu,Huaipeng Wang,Dan Xie,Yilin Sun
出处
期刊:Advanced Science
[Wiley]
日期:2024-06-17
卷期号:11 (33): e2400500-e2400500
被引量:14
标识
DOI:10.1002/advs.202400500
摘要
For several decades after Moore's Law is proposed, there is a continuous effort to reduce the feature-size of transistors. However, as the size of transistors continues to decrease, numerous challenges and obstacles including severe short channel effects (SCEs) are emerging. Recently, low-dimensional materials have provided new opportunities for constructing small feature-size transistors due to their superior electrical properties compared to silicon. Here, state-of-the-art low-dimensional materials-based transistors with small feature-sizes are reviewed. Different from other works that mainly focus on material characteristics of a specific device structure, the discussed topics are utilizing device structure design including vertical structure and nano-gate structure, and nanofabrication techniques to achieve small feature-sizes of transistors. A comprehensive summary of these small feature-size transistors is presented by illustrating their operation mechanism, relevant fabrication processes, and corresponding performance parameters. Besides, the role of small feature-size transistors based on low-dimensional materials in further reducing the small footprint is also clarified and their cutting-edge applications are highlighted. Finally, a comparison and analysis between state-of-art transistors is made, as well as a glimpse into the future research trajectory of low dimensional materials-based small feature-size transistors is briefly outlined.
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