退火(玻璃)
肖特基势垒
光电子学
肖特基二极管
材料科学
二极管
辐照
质子
复合材料
物理
量子力学
核物理学
作者
Weihao Lin,Yun Li,Junzheng Gao,Zhimei Yang,Min Gong,Mingmin Huang,Yuhao Wang,Chenglin Liao,Yao Ma,Gang Xiang
摘要
This study presents the enhancement of the electrical performance in vertical β-Ga2O3 Schottky barrier diodes (SBDs) through proton irradiation followed by annealing processes, along with the underlying physical mechanisms. Initially, the rectification behavior of these SBDs is significantly degraded following 5 MeV proton irradiation. However, for the device treated post annealing, following irradiation (D1-A500), the carrier concentration (ND) decreases by 72.1%, while the breakdown voltage (BV) increases by 124.5%. Deep level transient spectroscopy analysis reveals an increase in the concentration of acceptor traps, E2* (EC-0.74 eV), and the appearance of a new defect peak, E2 (EC-0.86 eV), attributed to proton irradiation and subsequent annealing. E2 is possibly associated with oxygen antisites (OGaII). Further simulations using technology computer aided design further verify that a reduction in ND improves the BV. Therefore, these findings elucidate the effect of proton irradiation on vertical β-Ga2O3 SBDs and emphasize the recovery of the devices by post-annealing treatment, providing valuable insights for application in radiation environments.
科研通智能强力驱动
Strongly Powered by AbleSci AI