钒
化学传感器
沉积(地质)
薄膜
氧化钒
材料科学
氧化物
化学工程
无机化学
纳米技术
化学
冶金
物理化学
电极
沉积物
古生物学
工程类
生物
作者
Yoshiki Tate,Aoi Yamamoto,Ryo Michibata,Yuichi Hirofuji,Kazuto Koike,Takeshi Rachi,Yasuhiro Naganuma,Ryotaro Kumashiro,Nobuya Hiroshiba
标识
DOI:10.35848/1347-4065/ad89ca
摘要
Abstract We report on the evaluation of the structure of VO x thin films under different fabrication conditions of the chemical solution deposition method and the pH response of an extended gate field effect transistor (EGFET)-type pH sensor. Polycrystalline V 2 O 5 thin films of 30 and 60 nm thick and amorphous VO x thin films of about 30 nm thick were successfully prepared under different precursor solution conditions. Using polycrystalline V 2 O 5 thin films and amorphous VO x thin films as extended gate (EG) electrodes, prototypes of EGFET-type pH sensors were fabricated and their pH response characteristics were investigated. The average pH responsibility of 64 mV pH −1 , which exceeded the theoretical Nernst limit, was observed over a wide pH range from 2.4 to 8.0 in the amorphous VO x extended gate sensor. It was also found that stable pH response measurements could be performed on amorphous VO x film samples.
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