铟
自发辐射
铟镓氮化物
发光二极管
材料科学
扩散
光电子学
辐射传输
氮化铟
氮化镓
二极管
镓
光发射
载流子寿命
宽禁带半导体
光学
物理
纳米技术
热力学
硅
图层(电子)
冶金
激光器
作者
Nick Pant,Emmanouil Kioupakis
标识
DOI:10.48550/arxiv.2311.03643
摘要
Experiments have shown that the light-emission efficiency of indium gallium nitride (InGaN) light-emitting diodes improves with increasing indium concentration. It is widely thought that compositional fluctuations due to indium incorporation suppress diffusion of carriers to non-radiative centers, thus leading to defect-insensitive emission. However, recent experiments have challenged this hypothesis by revealing unexpectedly long diffusion lengths at room temperature. Here, we demonstrate an alternative mechanism involving the correlated reduction in radiative and non-radiative recombination rates that explains the increase in light-emission efficiency of InGaN with increasing indium concentration, without invoking the suppression of carrier diffusion. Our analysis challenges the notion that carrier localization gives rise to defect tolerance in InGaN.
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