极紫外光刻
粒子(生态学)
极端紫外线
余辉
等离子体
粒径
梁(结构)
纳米颗粒
材料科学
原子物理学
粒子数
光学
化学
光电子学
纳米技术
物理
激光器
物理化学
天文
地质学
海洋学
量子力学
伽马射线暴
作者
Manis Chaudhuri,L.C.J. Heijmans,Mark van de Kerkhof,Pavel Krainov,D. Astakhov,Andrei M. Yakunin
标识
DOI:10.1088/1361-6595/acf342
摘要
Abstract Nanoparticle charging processes along with background spatial–temporal plasma profile have been investigated using 3D particle-in-cell simulations in a pulsed extreme ultraviolet (EUV) exposure environment. The particle charge polarity (positive or negative) strongly depends on its size, location, and background transient plasma conditions. The particle (100 nm diameter in size and conducting material) charge reaches a steady state in a single pulse (20 µ s) within the EUV beams compared to particles outside the beam requiring multiple pulses. The larger the particle size, the lower the number of pulses required to reach a steady state. The charge of a particle decreases with pressure at a faster rate outside the beam compared to inside. These results are crucial for particle contamination (defectivity) control strategies for EUV lithography machines.
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