Modeling of ferrite thin-film structure using FDTD method in optoelectronic devices

In this paper, we have studied a new film structure to improve the characteristics of optical filtering. We have changed the thickness and material of the metal oxide and ferrite material. And the structure of the film shows different absorbing properties, which can be utilized in different scenarios as we need. We chose this kind of thin film structure for simulation modeling with the finite-difference time-domain (FDTD) method, and analyzed of this nanostructure under three-dimensional conditions. The results demonstrate that in the three-dimensional structure, not only the material properties, but also the thickness. which will have a far-reaching influence on the absorption characteristics. Besides, Surface ion effect can affect the performance of the film. Therefore, this structure in the field of nanostructures has broad application prospects, such as microwave devices multichannel communication and so on.