Fault detection in reactive ion etching systems using one-class support vector machines

A robust method to detect faults in reactive ion etching systems using optical emission spectroscopy data is proposed. The approach is based on one-class support vector machines (SVMs). Unlike previously proposed fault detection methods, this approach only requires data collected during normal equipment operation to be trained. The results obtained suggest that this technique can detect equipment faults with exceptional accuracy. The SVM used detected all faults, yielding a detection accuracy of 100% with zero false alarms