(Pseudo-)symmetry-driven coherent interfaces and texture in epitaxial β-Ga 2 O 3 thin films on (001) diamond

材料科学 外延 格子(音乐) 凝聚态物理 钻石 单斜晶系 平面的 薄膜 纹理(宇宙学) 微观结构 结晶学 晶体学点群 金刚石立方 晶体结构 人造金刚石 成核 旋转(数学) 光学 对称(几何) 金刚石材料性能 失真(音乐) 化学物理 热的
作者
Ramandeep Mandia,Arpit Nandi,D. Cherns,Martin Kuball,David J. Smith
出处
期刊:Journal of Applied Crystallography [Wiley]
卷期号:58 (6): 1936-1946
标识
DOI:10.1107/s1600576725008283
摘要

Epitaxial β-Ga 2 O 3 films grown on (001) diamond substrates with a β-(Al/Ga) 2 O 3 buffer layer exhibit strong texture with multiple rotational domain variants sharing a common growth axis. This texture is attributed to two interrelated structural and geometrical factors: (1) pseudo-symmetry about the growth direction due to the high symmetry of the oxygen sublattice which results in close interplanar spacings of different lattice planes that determine the in-plane lattice mismatch, and hence two different crystallographic relationships and types of domain variants; (2) the lack of higher-order symmetry in the C 2/ m monoclinic structure of β-Ga 2 O 3 and the higher symmetry of the diamond substrate that leads to various subvariants. The microstructure of the films consists predominantly of domain clusters, with domains rotated by either ∼60° or 120° (±10°) relative to each other about the growth axis ∼[ 1 02]. Some domain boundaries (DBs), visible near edge-on in cross-sectional and plan-view projections, exhibit a high degree of coherency. These highly coherent DBs with small lattice rotation and/or distortion near the DB are observed where small in-plane and off-plane DB lattice mismatch is expected. Larger lattice mismatch between domains is accommodated by relatively large lattice rotation and/or distortion near the DB, as well as changes in DB structure and shape. Understanding the origin of texture and the characteristics of common planar defects in β-Ga 2 O 3 will offer insights into their impact on thermal and electrical transport properties and enable effective microstructural optimization for successful integration into future power electronics.

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