Application of atomic layer deposition in nanophotonics

We review our recent results on using Atomic Layer Deposition (ALD) in fabrication of nanophotonic waveguide devices. ALD is a unique thin film deposition method providing atomic level control of film composition and thickness, perfect step coverage, and large-area uniformity. We employ the advantages of ALD in connection with Sinanophotonics. We present several new structures based on filling silicon slot waveguides or coating the silicon strip waveguides with ALD-grown materials. Also ALD grown TiO₂ strip waveguides are introduced.