密度泛函理论
化学计量学
氧气
扩散
电荷(物理)
表面改性
库仑
化学
化学物理
材料科学
原子物理学
凝聚态物理
结晶学
计算化学
物理化学
物理
热力学
核物理学
量子力学
有机化学
电子
作者
Xin‐Ping Wu,Xue‐Qing Gong,Guanzhong Lu
摘要
Diffusion processes and reactions of H at stoichiometric and reduced CeO2(111) surfaces have been studied by using density functional theory calculations corrected by on-site Coulomb interactions (DFT + U). Oxygen vacancies on the surface are determined to be able to significantly affect the behavior of H by modifying the charge of surface lattice O through the occurrence of Ce(3+). It has been found that, at the reduced CeO2(111) surface, the adsorption strength of H as well as the H coupling barrier can be dramatically reduced compared to those at the stoichiometric surface, while H2O formation barrier is not significantly affected. Moreover, the diffusion of H at the reduced surface or into the bulk can occur more readily than that at stoichiometric CeO2(111).
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