铁电性
材料科学
异质结
薄膜
电阻式触摸屏
极化(电化学)
电导率
外延
光电子学
肖特基势垒
半导体
兴奋剂
图层(电子)
纳米技术
电介质
电气工程
物理化学
化学
工程类
二极管
作者
Yu Bai,Zhan Jie Wang,Yan Na Chen,Jian Zhong Cui
标识
DOI:10.1021/acsami.6b10992
摘要
In this work, epitaxial Pb(Zr0.4Ti0.6)O3 (PZT) thin films with different thicknesses were deposited on Nb-doped SrTiO3 (NSTO) single-crystal substrates by chemical solution deposition (CSD), and their ferroelectric resistive switching behaviors were investigated. The results showed that the maximum ON/OFF ratio up to 850 could be obtained in the PZT/NSTO heterostructure with the 150 nm thick PZT film. On the basis of the Schottky-Simmons model and the modified semiconductor theory, we also evaluated the interfacial built-in field and the depletion layer at the PZT/NSTO interface, which can be modulated strongly by the ferroelectric polarization, but are independent of the thickness of the PZT thin films. It is clear that the ferroelectric resistive switching is related to the ferroelectric polarization and modulated by the thickness of ferroelectric films. Therefore, there is an optimal thickness of the PZT film for the maximum ON/OFF ratio due to the ferroelectricity and conductivity mutually restricting. It can be expected that by adjusting the ferroelectricity and conductivity of the ferroelectric thin film and its thickness, the maximum switching ratio can be further improved.
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