计量学
光学
光子学
显微镜
纳米光子学
平版印刷术
材料科学
微电子
半导体器件制造
计算机科学
显微镜
分束器
硅
数字全息术
相位噪声
硅光子学
光刻
相位恢复
相(物质)
半导体
光电子学
全息术
相位调制
炸薯条
图像分辨率
相干衍射成像
尺寸计量学
斑点图案
相位对比成像
空间频率
红外显微镜
傅里叶光学
纳米光刻
作者
А. А. Власов,Igor Shevkunov,Karen Egiazarian,Mircea Guină,Jukka Viheriälä
摘要
Achieving high-yield heterogeneous integration in silicon photonics and advanced microelectronics requires compact, high-contrast metrology to inspect buried interfaces during die-to-wafer and stacked-chip assembly. This inspection underpins pre-bond alignment, post-bond offset verification, and defect screening, yet conventional through-silicon microscopy depends on objective optics and mechanical focusing that are difficult to integrate into high-throughput packaging tools. Building on progress in lensless computational imaging, we expand its role in the semiconductor value chain by introducing reflective-mode lensless through-silicon microscopy for packaged systems. Our module combines coherent 1064 nm illumination, a non-polarizing beam splitter reflective geometry, and a CMOS sensor; amplitude and phase are recovered from a single recorded diffraction pattern using iterative phase retrieval with denoising regularization. By eliminating objectives and moving parts, the architecture reduces footprint while preserving micrometer-scale spatial resolution. Using a USAF-1951 target, the system resolves features down to 2.19 μm under a conservative contrast criterion. Contrast-transfer analysis shows that the phase channel delivers markedly higher contrast and improved feature fidelity across the field of view, while the amplitude channel remains consistent with previously reported through-silicon near-infrared (NIR) microscopy performance. We validate application relevance by imaging silicon-photonic PICs and heterogeneous III–V/Si assemblies through the silicon substrate, resolving waveguides, metallization, chip edges, alignment markers, and bonding-related defects. In stacked-chip configurations, digital refocusing enables depth-selective reconstruction of multiple layers. These results position reflective lensless through-silicon phase imaging as a scalable, compact alternative to conventional NIR/short-wave infrared microscopy for semiconductor assembly metrology, enabling in-tool inspection and alignment verification for emerging co-packaged optics and 3D chiplet architectures.
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