A Patternable, Anti-Reflective Light Blocking Layer using a Nano-Particle Suspension in Photoresist
作者
Matthew Hamblin,Thane Downing,Sophia Anderson,Aaron R. Hawkins,Holger Schmidt
标识
DOI：10.1109/ipcon.2018.8527287
摘要
This paper presents a method for fabricating a broadband anti-reflective light blocking layer patternable on a micron scale using standard photolithography using a combination of photoresist and Al 2 O 3 nanoparticles over an aluminum layer.
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(2025-6-4)
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