While most graphene devices fabricated so far have been by transferring graphene onto flat substrates first, an interesting approach would be to transfer graphene onto patterned substrates to suspend graphene for future graphene nanoelectromechanical device applications. This novel "transfer-last" fabrication is beneficial for reducing possible damage of the suspended graphene caused by subsequent undercutting processes and typical substrate interactions. On the other hand, reduction of contact resistance between graphene and various electrodes, and possible integration with silicon technology are the issues to be investigated. This work focuses on developing the technique to transfer graphene on patterned nanostructures made of gold, nanocrystalline graphite (NCG) and silicon.