微尺度化学
微观结构
材料科学
电解质
制作
纳米技术
纳米尺度
千分尺
表征(材料科学)
化学工程
复合材料
电极
机械工程
化学
医学
数学教育
数学
替代医学
物理化学
病理
工程类
作者
Chunjian Shen,Mo Yu,Di Zhu
标识
DOI:10.1080/17452759.2023.2292700
摘要
ABSTRACTLocally confined electrodeposition of precursors in liquid is one of the most effective approaches for additive manufacturing of metal microstructures. However, reported data were overwhelmingly obtained at the micrometer scale, whereas sub-microscale and nanoscale microstructures are of interest in electromagnetic or optical fields. In this paper, we propose a cold-constrained local electrodeposition (CCLE) technique to address the issue that locally confined electrodeposition of precursors in liquid is challenging in the fabrication of sub-microscale three-dimensional microstructures. Microstructure printing is conducted via locally confined electrodeposition by a pipette with a sub-microscale opening to deliver electrodeposition electrolyte in a supporting electrolyte. The electrolytes are cooled to 5 °C, which constrains the large-scale diffusion of the electrodeposition electrolyte and significantly reduces the electrodeposition area. It is found that the proposed CCLE technique can print sub-microscale (minimum size is low to 290 nm) structures, which have highly uniform deposits, smooth surfaces and high strength.
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