材料科学
阻塞(统计)
光电子学
晶体管
宽禁带半导体
电压
氮化镓
带隙
降级(电信)
电力电子
氮化物
电场
高压
功率(物理)
击穿电压
功率半导体器件
阈值电压
电气工程
高电子迁移率晶体管
场效应晶体管
切换时间
作者
Aditya Dev Varma,Tolen Nelson,Joshua Park,Tariq Jamil,S M Tazbiul Hasan,Abdullah Al Mamun Mazumder,Asif Khan,Tomás Palacios,Karl D. Hobart,Marko J Tadjer
标识
DOI:10.35848/1347-4065/aeac40
摘要
Abstract Ultra-wide bandgap Al-rich AlGaN high electron mobility transistors (HEMTs) are compelling for next-generation power electronics due to their high critical electric fields. However, the performance of nitride HEMTs is limited by RON degradation during switching operation. To date, the switching performance of AlGaN-channel HEMTs has not been evaluated under high voltage (> 600 V) off-state bias. We demonstrate dynamic performance of AlGaN-channel HEMTs under off-state blocking voltages up to 1 kV, showing RON degradation of 1.5x/650 V and 6.5x/1,000V with a single field plate structure. These results highlight initial progress and challenges towards engineering degradation-free AlGaN-channel kV lateral transistors.
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