Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique

The choice of mask materials and fabrication route for a projection electron-beam lithography system is subject to a variety of constraints. Some are encountered in most lithographic techniques, while some are unique to the scattering with regular limitation for projection electron lithography SCALPEL technique. We have developed methods for analyzing the performance of potential mask materials and constructions. These have been used to determine the composition of a prototype mask. Results from such a mask are presented.