Doping, Alloying, or Compositing? How Copper Introduction Pathways Dictate Thermoelectric Performance in GeTe

材料科学 热电效应 掺杂剂 电子迁移率 热电材料 兴奋剂 有效质量(弹簧-质量系统) 光电子学 热导率 声子 凝聚态物理 功勋 电阻率和电导率 半导体 空位缺陷 纳米技术 相(物质) 载流子寿命 退火(玻璃) 锌黄锡矿 载流子密度 工作(物理) 扩散 无量纲量 塞贝克系数
作者
Y Li,Yunpu Zhang,Yuting Zhang,Shaoqin Wang,Jiye Zhang,Kai Guo,Jun Luo
出处
期刊:ACS Applied Materials & Interfaces [American Chemical Society]
标识
DOI:10.1021/acsami.6c09295
摘要

The thermoelectric performance of GeTe is critically governed not only by the choice of dopant but also by the pathway through which it is introduced. Herein, we systematically compare three distinct Cu introduction routes in a Ge 0.95 Bi 0.05 Te matrix: direct Cu doping, BaCu 2 Te 2 alloying, and BaCu 2 Te 2 compositing. All three approaches effectively reduce the excessively high hole concentration, thereby decreasing electrical conductivity and increasing the Seebeck coefficient. However, they exhibit markedly different regulation mechanisms. Direct Cu doping achieves the most pronounced reduction in carrier concentration and optimizes carrier mobility but yields only a moderate improvement in the dimensionless thermoelectric figure of merit zT (∼1.86) due to limited phonon scattering. In contrast, the compositing strategy allows limited Cu diffusion into the matrix, while Ba induces additional Ge vacancies that partially compensate for the carrier reduction. The secondary phase introduces strong carrier scattering, suppressing carrier mobility, and also significantly enhances the density-of-states effective mass and reduces lattice thermal conductivity. Consequently, the Ge 0.95 Bi 0.05 Te + 2.0 wt % BaCu 2 Te 2 composite attains a peak zT exceeding 2.0 at 623 K. BaCu 2 Te 2 alloying exhibits intermediate behavior, with more Cu incorporation and stronger vacancy compensation, also achieving a zT near 2.0. This work demonstrates that the Cu introduction pathway dictates the balance between carrier concentration modulation, mobility preservation, effective mass enhancement, and phonon scattering, providing a paradigm for synergistically integrating doping and secondary-phase engineering in GeTe-based thermoelectrics.
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