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110 积分 2026-01-30 加入
Wafer-Voltage Measurement in Plasma Processes by Means of a New Probe Method and an Impedance Monitor
2天前
已完结
Effect of showerhead electrode materials on high aspect ratio etching of SiO2
2个月前
已关闭
Analysis of Focus Ring Effect on Ion Angle Distribution in a Pulsed RF Capacitively Coupled Plasma Using a Two-Dimensional Particle-in-Cell Simulation
4个月前
已关闭
Focus ring geometry influence on wafer edge voltage distribution for plasma processes
4个月前
已完结
Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
4个月前
已完结
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