Lv41
588 积分 2026-01-30 加入
I n s i t u laser diagnostic studies of plasma-generated particulate contamination
1小时前
已完结
Behavior of Dust Particles in Plasma Etching Apparatus
4天前
已完结
Investigation of contamination particles generation and surface chemical reactions on Al2O3, Y2O3, and YF3 coatings in F-based plasma
4天前
已完结
Nucleation in Plasmas
5天前
已完结
Wafer-Voltage Measurement in Plasma Processes by Means of a New Probe Method and an Impedance Monitor
1个月前
已完结
Effect of showerhead electrode materials on high aspect ratio etching of SiO2
3个月前
已关闭
Analysis of Focus Ring Effect on Ion Angle Distribution in a Pulsed RF Capacitively Coupled Plasma Using a Two-Dimensional Particle-in-Cell Simulation
6个月前
已关闭
Focus ring geometry influence on wafer edge voltage distribution for plasma processes
6个月前
已完结
Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors
6个月前
已完结
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