Lv5
1172 积分 2023-06-20 加入
Atomic Layer Etching of MoS2 using cyclic Argon and CF4 plasmas in deposition regime at cryogenic temperatures
1天前
求助中
Titanium as Oxygen Scavenging/Etching Stop Layers to Boost Ion of Self-Aligned IGZO Top-Gate Transistors
1个月前
已完结
A Boundary-Aware Surrogate Model for Predicting Feature-Scale TiN Etching Profiles
1个月前
已完结
Evaluation of Si thin film formed from Si0.7Ge0.3/Si/Si0.7Ge0.3-stacked layers with CF4/H2 plasma for Si-nanosheet formation toward GAA transistor application
1个月前
已关闭
Highly selective radical etching of Si 3 N 4 using NF 3 /O 2 /N 2 /H 2 mixtures on 3D multilayer stack transistor integration
1个月前
已完结
Study of High Aspect Ratio SiN WG Etch in Silicon Photonics
1个月前
已完结
Improvement of both verticality and roughness in sidewall of metal oxide resist patterns etching with BCl3 pulsed plasma
1个月前
已关闭
Overcoming BEOL patterning challenges for the ArF immersion extension
1个月前
已关闭
Improvement of both verticality and roughness in sidewall of metal oxide resist patterns etching with BCl3 pulsed plasma
1个月前
已关闭
High-selectivity inductively coupled plasma etching of HfO2 by using metal hard mask
1个月前
已关闭
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