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1262 积分 2023-06-20 加入
Etch Properties of TiN Thin Film in Metal–Insulator–Metal Capacitor Using Inductively Coupled Plasma
3小时前
待确认
Progress report on high aspect ratio patterning for memory devices
11天前
已完结
Low-loss silicon nitride photonic ICs for near-infrared wavelength bandwidth
11天前
已完结
Silicon Nitride Integrated Photonics from Visible to Mid‐Infrared Spectra
11天前
已完结
Vertical sidewall of silicon nitride mask and smooth surface of etched-silicon simultaneously obtained using CHF3/O2 inductively coupled plasma
11天前
已完结
Effect of undercut on the resonant behaviour of silicon nitride cantilevers
14天前
已完结
Precision etching process optimization and mechanism investigation for ultrathin Al2O3 thin films at the bottom of trenches
28天前
已关闭
Cryogenic plasma etching for SiO2/SiN dielectric films: a mini review
28天前
已完结
Advances in core technologies for semiconductor manufacturing: applications and challenges of atomic layer etching, neutral beam etching and atomic layer deposition
1个月前
已完结
Future of plasma etching for microelectronics: Challenges and opportunities
1个月前
已完结
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