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1292 积分 2023-06-20 加入
Advances in core technologies for semiconductor manufacturing: applications and challenges of atomic layer etching, neutral beam etching and atomic layer deposition
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Future of plasma etching for microelectronics: Challenges and opportunities
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Foundations of atomic-level plasma processing in nanoelectronics
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The grand challenges of plasma etching: a manufacturing perspective
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Advances in etching of 2D nanomaterials: Research challenges and advanced devices
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Recent Advances of Plasma Technology Applications in 2D Materials and Electronics
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Etching: The Art of Semiconductor Micromachining
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A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide
1天前
已完结
Enabling Plasma Etch Solution for GaN Technology
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Performance characterization and kinetic analysis of atmosphere-breathing electric propulsion intake device
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