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198 积分 2025-07-29 加入
Voltage- and Metal-assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review
13天前
已完结
Recent advances in plasma etching for micro and nano fabrication of silicon-based materials: a review
13天前
已完结
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning
1个月前
已完结
Cyclic etching of silicon oxide using NF3/H2 remote plasma and NH3 gas flow
1个月前
已完结
Invited) Control of Atomic Layer Reactions in Plasma Processing
1个月前
已完结
Selective isotropic etching of SiO2 over Si3N4 using NF3/H2 remote plasma and methanol vapor
2个月前
已完结
Role of N2 during chemical dry etching of silicon oxide layers using NF3/N2/Ar remote plasmas
2个月前
已完结
Silicon epitaxial film growth on silicon substrate exposed to UV-excited NF3/H2 gas for native oxide removal
2个月前
已完结
High-Speed Ultrasmooth Etching of Fused Silica Substrates in SF<sub>6</sub>, NF<sub>3</sub>, and H<sub>2</sub>O-Based Inductively Coupled Plasma Process
2个月前
已完结
Surface roughness of silicon carbide etching in a NF3 inductively coupled plasma
2个月前
已完结
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