Lv5
820 积分 2026-05-18 加入
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride
2天前
已完结
Effect of gas additives on reaction barriers in cryo etching of silicon oxide and nitride
2天前
待确认
Pattern dependent plasma charging effect in high aspect ratio 3D NAND architecture
10天前
已完结
Autonomous hybrid optimization of a SiO2 plasma etching mechanism
21天前
已完结
Profile evolution and mechanisms in pulsed-bias plasma etching of high-aspect-ratio silicon pillars for wafer-scale metasurface manufacturing
21天前
已完结
Study on contact distortion during high aspect ratio contact SiO2 etching
27天前
已完结
Charging effect simulation model used in simulations of plasma etching of silicon
30天前
已完结
Atomic layer etching of silicon dioxide using alternating C 4 F 8 and energetic Ar + plasma beams
30天前
已完结
The CORE Sequence: A Nanoscale Fluorocarbon-Free Silicon Plasma Etch Process Based on SF6/O2 Cycles with Excellent 3D Profile Control at Room Temperature
1个月前
已完结
A molecular dynamics investigation of fluorocarbon based layer-by-layer etching of silicon and SiO2
1个月前
已完结
Synthesis of novel 2,3-substituted quinazolin-4-ones by condensation of alkyl or aromatic diamines with 5-(N-arylimino)-4-chloro-5H-1,2,3-dithiazoles
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