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48 积分 2025-03-06 加入
Structural Changes of La2O3-doped Hf-based High-k Dielectrics during Aqueous HF Treatment
1个月前
已完结
Effects of chlorine residue in atomic layer deposition hafnium oxide: A density-functional-theory study
6个月前
已完结
Redox Chloride Elimination Reaction: Facile Solution Route for Indium‐Free, Low‐Voltage, and High‐Performance Transistors
8个月前
已完结
Work function and thermal stability of Ti1−xAlxNy for dual metal gate electrodes
8个月前
已完结
Composition dependence of the work function of Ta1−xAlxNy metal gates
8个月前
已完结
Dual Cocatalytic Sites Synergize NiFe Layered Double Hydroxide to Boost Oxygen Evolution Reaction in Anion Exchange Membrane Water Electrolyzer
9个月前
已完结
(Invited) Factors Impacting Threshold Voltage in Advanced CMOS Integration: Gate Last (FINFET) vs. Gate First (FDSOI)
9个月前
已完结
Ta-Doped NiFe Layered Double Hydroxide for Efficient Alkaline Water Oxidation at Ampere-Level Current with 2000 h Durability †
9个月前
已完结
State of the Art and Future Perspectives in Advanced CMOS Technology
9个月前
已完结
Advanced high-k/metal gate stack progress and challenges – a materials and process integration perspective
9个月前
已完结
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