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48 积分 2025-03-06 加入
Effects of chlorine residue in atomic layer deposition hafnium oxide: A density-functional-theory study
5个月前
已完结
Redox Chloride Elimination Reaction: Facile Solution Route for Indium‐Free, Low‐Voltage, and High‐Performance Transistors
7个月前
已完结
Work function and thermal stability of Ti1−xAlxNy for dual metal gate electrodes
7个月前
已完结
Composition dependence of the work function of Ta1−xAlxNy metal gates
7个月前
已完结
Dual Cocatalytic Sites Synergize NiFe Layered Double Hydroxide to Boost Oxygen Evolution Reaction in Anion Exchange Membrane Water Electrolyzer
7个月前
已完结
(Invited) Factors Impacting Threshold Voltage in Advanced CMOS Integration: Gate Last (FINFET) vs. Gate First (FDSOI)
7个月前
已完结
Ta-Doped NiFe Layered Double Hydroxide for Efficient Alkaline Water Oxidation at Ampere-Level Current with 2000 h Durability †
7个月前
已完结
State of the Art and Future Perspectives in Advanced CMOS Technology
8个月前
已完结
Advanced high-k/metal gate stack progress and challenges – a materials and process integration perspective
8个月前
已完结
Elimination of Cu Precipitation in Al-Cu films due to the Effect of Thermal Cycles
8个月前
已关闭
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