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Study of Tungsten-Doped Carbon Hard Mask Etch Process Using NF3/O2 Based Chemistry
1个月前
已完结
Study of Tungsten-Doped Carbon Hard Mask Etch Process Using NF3/O2 Based Chemistry
2个月前
已完结
Silicon nitride etching performance of CH2F2plasma diluted with argon or krypton
2个月前
已完结
Patterning of silicon nitride for CMOS gate spacer technology. I. Mechanisms involved in the silicon consumption in CH3F/O2/He high density plasmas
2个月前
已完结
Silicon nitride etching performance of CH2F2plasma diluted with argon or krypton
2个月前
已完结
Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O2, and Ar
2个月前
已完结
A Comparison of CF4, CHF3 and C4F8 + Ar/O2 Inductively Coupled Plasmas for Dry Etching Applications
2个月前
已完结
A mechanism for particle size segregation in three dimensions
2个月前
已完结
Etching Characteristics and Mechanisms of Mo and Al2O3 Thin Films in O2/Cl2/Ar Inductively Coupled Plasmas: Effect of Gas Mixing Ratios
2个月前
已完结
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