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Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4 + CHF3 + O2 Inductively Coupled Plasma
1个月前
已完结
Role of fluorocarbon film formation in the etching of silicon, silicon dioxide, silicon nitride, and amorphous hydrogenated silicon carbide
1个月前
已完结
Modeling etch rate and uniformity of oxide via etching in a CHF3/CF4 plasma using neural networks
1个月前
已完结
Vertical sidewall of silicon nitride mask and smooth surface of etched-silicon simultaneously obtained using CHF3/O2 inductively coupled plasma
1个月前
已完结
Etching Mechanisms and Surface Conditions for SiOxNy Thin Films in CF4 + CHF3 + O2 Inductively Coupled Plasma
1个月前
已关闭
Parameters of Plasma and Way of Etching Silicon in a CF4 + CHF3 + O2 Mixture
1个月前
已完结
A Comparison of CF4, CHF3 and C4F8 + Ar/O2 Inductively Coupled Plasmas for Dry Etching Applications
1个月前
已完结
Study of Tungsten-Doped Carbon Hard Mask Etch Process Using NF3/O2 Based Chemistry
3个月前
已完结
Study of Tungsten-Doped Carbon Hard Mask Etch Process Using NF3/O2 Based Chemistry
4个月前
已完结
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