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150 积分 2024-03-29 加入
A mechanism for particle size segregation in three dimensions
16小时前
待确认
Etching Characteristics and Mechanisms of Mo and Al2O3 Thin Films in O2/Cl2/Ar Inductively Coupled Plasmas: Effect of Gas Mixing Ratios
4天前
已完结
How Ebola and Marburg viruses battle the immune system
18天前
已完结
Anisotropic atomic layer etching of molybdenum by formation of chloride/oxychloride
22天前
已完结
Evaluation of vapor pressure of MoO2Cl2 and its initial chemical reaction on a SiO2 surface by ab initio thermodynamics
23天前
已完结
Effects of tungsten alloying and fluorination on the oxidation behavior of intermetallic titanium aluminides for aerospace applications
1个月前
已完结
WO3 and W Thermal Atomic Layer Etching Using “Conversion-Fluorination” and “Oxidation-Conversion-Fluorination” Mechanisms
1个月前
已完结
Etching of tungsten via a combination of thermal oxide formation and wet-chemical oxide dissolution
1个月前
已完结
Control of oxidation on NiSix during etching and ashing processes
1个月前
已完结
Investigation of the etching mechanism of silicon nitride by CF4/O2/Ar gas mixture plasma in ICP
1个月前
已完结
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