Lv12
50 积分 2024-03-29 加入
Control of oxidation on NiSix during etching and ashing processes
53分钟前
待确认
Investigation of the etching mechanism of silicon nitride by CF4/O2/Ar gas mixture plasma in ICP
1小时前
已完结
Control of oxidation on NiSix during etching and ashing processes
17小时前
已关闭
Plasma etching: Yesterday, today, and tomorrow
1年前
已完结
The erosion behaviors of Y2O3 and YF3 coatings under fluorocarbon plasma
1年前
已完结
Fluorination mechanisms of Al2O3 and Y2O3 surfaces irradiated by high-density CF4∕O2 and SF6∕O2 plasmas
1年前
已完结
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