| 标题 |
Accelerating EUV metal oxide resist development via physicochemical feature-enhanced machine learning |
| 网址 | |
| DOI |
10.1117/12.3118009
doi
|
| 其它 |
期刊:International Conference on Extreme Ultraviolet Lithography 2026 作者:Sungjin Jung; Seonghyun Hwang; Jong Hyun Kim; Hong Joon Lee; Jingoo Yoon; et al 出版日期:2026-10-23 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人或该文件上传人下载。 |
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(2025-6-4)