| 标题 |
Effect of O2 plasma treatment on density-of-states in a-IGZO thin film transistors |
| 网址 | |
| DOI | |
| 其它 |
期刊:Electronic Materials Letters 作者:Xingwei Ding; Fei Huang; Sheng Li; Jianhua Zhang; Xueyin Jiang; Zhilin Zhang 出版日期:2016-11-28 |
| 求助人 | |
| 下载 |
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(2025-6-4)