| 标题 |
Plasma assisted deposition of thin carbon films from methane and the influence of the plasma parameters and additional gases |
| 网址 | |
| DOI | |
| 其它 |
期刊:Vacuum 作者:F. Hamelmann; A. Aschentrup; A. Brechling; U. Heinzmann; M. Abrashev; et al 出版日期:2004-11-05 |
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(2025-6-4)