| 标题 |
Etch properties of resists modified by sequential infiltration synthesis |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 作者:Yu-Chih Tseng; Qing Peng; Leonidas E. Ocola; David A. Czaplewski; Jeffrey W. Elam; Seth B. Darling 出版日期:2011 |
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(2025-6-4)