| 标题 |
Reactive sticking of As4 during molecular beam homoepitaxy of GaAs, AlAs, and InAs |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 作者:T. M. Brennan; J. Y. Tsao; B. E. Hammons 出版日期:1992-01-01 |
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(2025-6-4)