| 标题 |
Plasma-enhanced and thermal atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide, [Al(CH3)2(μ-OiPr)]2, as an alternative aluminum precursor |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 作者:Stephen E. Potts; Gijs Dingemans; Christophe Lachaud; W. M. M. Kessels 出版日期:2012-02-18 |
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(2025-6-4)