| 标题 |
Photolithography process optimization: insights into negative tone resists and spray coating |
| 网址 | |
| DOI |
10.1117/12.3051472
doi
|
| 其它 |
期刊:Advances in Patterning Materials and Processes XLII 作者:Johanna Rimböck; Martin Weinhart; Jakob Holzapfel; Armin Schreiner; Matthias Brunnbauer; et al 出版日期:2025-04-22 |
| 求助人 | |
| 下载 |
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(2025-6-4)