| 标题 |
 Low-energy electron exposure and reactive ion etching characteristics of hybrid EUV photoresist synthesized by molecular atomic layer deposition |
| 网址 | |
| DOI |
10.1117/12.2641794
doi
|
| 其它 |
期刊：International Conference on Extreme Ultraviolet Lithography 2022 作者：Won-Il Lee; Ashwanth Subramanian; Nikhil M. Tiwale; Dan N. Le; Su Min Hwang; et al 出版日期：2022-11-11 |
| 求助人 | |
| 下载 | 暂无链接，等待应助者上传 |
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