| 标题 |
Plasma-surface interactions of advanced photoresists with C4F8∕Ar discharges: Plasma parameter dependencies |
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| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:S. Engelmann; R. L. Bruce; M. Sumiya; T. Kwon; R. Phaneuf; et al 出版日期:2009-02-12 |
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(2025-6-4)