| 标题 |
Resistless electron beam lithography process for the fabrication of sub-50 nm silicide structures |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 作者:D. Drouin; J. Beauvais; E. Lavallée; S. Michel; J. Mouine; R. Gauvin 出版日期:1997 |
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(2025-6-4)